Reference No.: QM 2025/14
At the IFOX institute at HZB, we work on functional oxide thin films and nanostructures in combination with semiconductors for energy-efficient information technology. We focus on material synthesis, detailed structural characterisation using advanced methods and device properties for neuromorphic computing applications. You will work within the framework of the ERC Advanced Grant LUCIOLE (Layering, Understanding, Controlling, Integrating Ferroelectric Polar textures on Silicon) and develop various processes for the production of micro- and nanodevices. These processes will be based on thin film deposition, lithography and etching. You will have access to a high-resolution laser writing lithography tool and an electron beam masker and work closely with a team of motivated scientists researching different materials and devices.
Fixed term contract for 12 months. The salary is based on the Collective Agreement for the German Public Service (TVöD-Bund).
The following documents must be provided for your application:-
We look forward to receiving your application via our application management system by 26.09.2025. For reasons of data protection regulations, we are unfortunately unable to consider applications that reach us by any other means (such as email or mail) in the application process.
We very much want our workplace to be diverse, and welcome applications from people with different backgrounds. It is our mission to promote equal opportunities and to improve women’s representation in the workforce. We are therefore very interested in receiving applications from women. Where the qualifications are met, we will give preference to people with disabilities.
Helmholtz-Zentrum Berlin für Materialien und Energie GmbH
Hahn-Meitner-Platz 1, 14109 Berlin
www.helmholtz-berlin.de
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Catherine Dubourdieu
+4930806242868
catherine.dubourdieu@helmholtz-berlin.de
IMPRINT & DATA PROTECTION
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